Naruo Ueda

Title: Naruo Ueda: Innovator in Polishing Agents and Semiconductor Fabrication

Introduction

Naruo Ueda is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of polishing agents and semiconductor fabrication. With a total of 4 patents to his name, Ueda's work has had a considerable impact on the industry.

Latest Patents

Ueda's latest patents include a slurry containing manganese oxide and a fabrication process for semiconductor devices. The first patent describes a slurry that contains MnO₂ or other manganese oxides as the primary component of abrasive particles. This invention also outlines a polishing process using the manganese oxide abrasive, which is crucial for semiconductor device fabrication. His second patent focuses on a fine particulate polishing agent composed of fine particles of a solid solution made from single-crystal ceric oxide and silicon dioxide. This innovative polishing agent is produced through a detailed method involving mixing, drying, thermal treatment, and deagglomeration.

Career Highlights

Throughout his career, Ueda has worked with prominent companies such as Mitsui Mining & Smelting Co., Ltd. and Fujitsu Corporation. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in polishing technology.

Collaborations

Ueda has collaborated with notable coworkers, including Kenzo Hanawa and Naoyoshi Mochizuki. Their combined expertise has likely enhanced the quality and applicability of Ueda's inventions.

Conclusion

Naruo Ueda's contributions to the field of polishing agents and semiconductor fabrication demonstrate his innovative spirit and technical expertise. His patents continue to influence the industry, showcasing the importance of research and development in technology.