The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1998
Filed:
Sep. 25, 1996
Naruo Ueda, Saitama, JP;
Norikazu Yamamoto, Saitama, JP;
Kenzo Hanawa, Saitama, JP;
Kazuhiko Kato, Saitama, JP;
Mitsui Mining and Smelting Co., Ltd., Tokyo, JP;
Abstract
A fine particulate polishing agent is based on cerium oxide and silicon oxide; a slurry polishing agent comprises the foregoing fine particulate polishing agent which can be prepared by a method which comprises the steps of mixing, with stirring, cerium oxide fine particles, silica sol and a liquid; drying the mixture; mixing the material with a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry. Preferably, the dried particulate material is subjected to a thermal treatment at a high temperature of 150.degree. to 1200.degree. C., preferably 800.degree. to 900.degree. C., thereby to produce a solid solution of cerium oxide and silicon oxide. The slurry polishing agent can ensure the achievement of surface roughness comparable to or superior to that achieved by the colloidal silica polishing agents and a high polishing rate at least comparable to that achieved by the conventional cerium oxide polishing agents.