Location History:
- Shizuoka, JP (2008 - 2010)
- Susono, JP (2012)
- Shizuoka-ken, JP (2012 - 2014)
Company Filing History:
Years Active: 2008-2014
Title: Innovations in Thin Film Technology by Narishi Gonohe
Introduction
Narishi Gonohe is a prominent inventor based in Shizuoka-ken, Japan, who has made significant contributions to the field of thin film technology. With a portfolio of seven patents, Gonohe has been at the forefront of developing advanced methods for forming high-quality tantalum nitride films, which have crucial applications in various technological sectors.
Latest Patents
Gonohe's latest patents reveal his innovative approach to thin film fabrication. One of his noteworthy inventions is the "Method for forming tantalum nitride film," which involves the simultaneous introduction of a raw gas composed of a coordination compound of elemental tantalum and nitrogen gas into a film-forming chamber. This method results in a tantalum nitride film rich in tantalum atoms, featuring low resistance and high adherence to copper films, making it a valuable barrier film. Additionally, his "Method of manufacturing film" focuses on low-temperature barrier film formation, using a catalyst within a vacuum chamber to create a thin film on an object by reacting raw and reactive gases.
Career Highlights
Gonohe's career includes his role at Ulvac, Inc., a leading provider of vacuum technology solutions. His innovative techniques in thin film deposition have positioned him as a key player in advancing material science. His work emphasizes the development of robust barrier films essential in microelectronics and semiconductor industries.
Collaborations
Throughout his career, Gonohe has collaborated with notable coworkers such as Satoru Toyoda and Harunori Ushikawa. Together, they have worked on various projects related to film deposition techniques, enhancing the efficiency and performance of advanced materials used in various technological applications.
Conclusion
Narishi Gonohe's contributions to thin film technology and his innovative patents continue to shape the future of materials science. His expertise in fabricating high-quality tantalum nitride films and other barrier materials demonstrates his commitment to advancing technological solutions. As he continues his work at Ulvac, Inc., Gonohe is poised to influence the evolving landscape of thin film applications.