Kyoto, Japan

Naoyuki Tsukamoto

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Flosfia Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoyuki Tsukamoto. Retrieved from https://idiyas.com/inventor/naoyuki-tsukamoto-wq0ch8oe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Naoyuki Tsukamoto: Innovator in Film Formation Technology

Introduction

Naoyuki Tsukamoto is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of film formation technology, holding a total of 3 patents. His innovative methods focus on enhancing mass productivity and efficiency in the creation of metal oxide films.

Latest Patents

Tsukamoto's latest patents include a film formation method that boasts excellent mass productivity. This method significantly reduces the time required to form a film with a desired thickness. The process involves atomizing or dropletizing a liquid containing a metal complex, which serves as the raw material solution. The resulting mist or droplets are then conveyed to a base using a carrier gas, where a metal oxide film is formed through thermal reaction. The metal oxide film comprises a crystalline oxide semiconductor, utilizing a metal complex that exhibits an exothermic peak at temperatures between 480° C. and 520° C. during thermogravimetric-differential thermal analysis.

Another notable patent by Tsukamoto describes a similar film formation method that also emphasizes mass productivity. This method employs one or multiple aqueous solutions containing at least one metal complex with two or more different ligands, as well as a gallium compound. The process includes atomizing or dropletizing the solutions, conveying the mist or droplets to a base, and thermally reacting them to form a metal oxide film.

Career Highlights

Tsukamoto is currently associated with Flosfia Inc., where he continues to develop innovative technologies in film formation. His work has positioned him as a key figure in advancing semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Makoto Shimizu and Hiroyuki Ando, who contribute to the collaborative efforts in research and development at Flosfia Inc.

Conclusion

Naoyuki Tsukamoto's contributions to film formation technology exemplify his commitment to innovation and efficiency. His patents reflect a deep understanding of materials science and engineering, making him a valuable asset in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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