The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Mar. 13, 2024
Flosfia Inc., Kyoto, JP;
Makoto Shimizu, Tokyo, JP;
Hiroshi Shiho, Tokyo, JP;
Hiroyuki Ando, Kyoto, JP;
Naoyuki Tsukamoto, Kyoto, JP;
Yuji Kato, Kyoto, JP;
FLOSFIA, INC., Kyoto, JP;
Abstract
A film formation method having an excellent mass productivity, whereby a time required for forming a film having a desired thickness is short. The film formation method uses one aqueous solution or different aqueous solutions containing at least one of a metal complex having two or more different ligands and a metal complex having same ligands and substituents as well as a gallium compound, in which the metal complex having the two or more different ligands has nitrogen atom, and the metal complex having the same ligands and substituents has a halogen atom, and the method includes atomizing or dropletizing one aqueous solution or different aqueous solutions, conveying resulting mist or droplets to a base by a carrier gas, and forming a metal oxide film on the base by thermally reacting the mist or droplets in the vicinity of the base.