Naoyuki Kishikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of flow measurement technology, holding a total of 9 patents. His innovative designs focus on enhancing the accuracy and stability of flow detection systems.

Latest Patents

Kishikawa's latest patents include a flow measuring device that inhibits a reduction of flow detection accuracy caused by bottom flow influences. This device features a concave portion at the bottom surface of the installing portion, which minimizes the impact of bottom flow entering through the fit gap between the flow detecting element and its installation area. Another notable patent is a flow measuring device with multiple bending portions. This design incorporates a sub-bypass passage that precedes a bypass passage linked to a flow detecting element. The inclined wall surfaces of the bypass passage help reduce variations in size due to foreign material build-up, resulting in a more stable flow velocity of the measured fluid.

Career Highlights

Naoyuki Kishikawa is currently employed at Mitsubishi Electric Corporation, where he continues to develop innovative solutions in flow measurement technology. His work has significantly advanced the capabilities of flow detection systems, making them more reliable and efficient.

Collaborations

Kishikawa collaborates with talented colleagues such as Yuji Ariyoshi and Masahiro Kawai. Together, they contribute to the ongoing research and development efforts at Mitsubishi Electric Corporation.

Conclusion

Naoyuki Kishikawa's contributions to flow measurement technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to improving the accuracy and reliability of flow detection systems, making a lasting impact in the field.

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