Location History:
- Yokohama, JP (1998)
- Tokyo, JP (2022)
Company Filing History:
Years Active: 1998-2025
Title: Naoya Hanafusa: Innovator in Semiconductor Manufacturing Technology
Introduction
Naoya Hanafusa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His innovative work focuses on improving the efficiency and effectiveness of semiconductor production processes.
Latest Patents
Hanafusa's latest patents include a subfab area installation apparatus designed to reduce power consumption in semiconductor manufacturing. This apparatus features a vacuum pump that evacuates processing gas from the processing chamber, a cooling unit that cools a first circulation liquid, and a heating unit that heats a second circulation liquid. Additionally, it includes an abatement device to detoxify the processing gas discharged from the vacuum pump and a cooling-liquid line that facilitates the flow of cooling liquid from a cooling source. The design aims to optimize the cooling and heating processes within semiconductor manufacturing equipment.
Career Highlights
Throughout his career, Naoya Hanafusa has worked with notable companies such as Ebara Corporation and Ebara Refrigeration Equipment & Systems Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Hanafusa has collaborated with talented individuals in his field, including Kazutomo Miyazaki and Motoshi Kohaku. These partnerships have contributed to the advancement of his projects and the successful implementation of his inventions.
Conclusion
Naoya Hanafusa is a key figure in the semiconductor manufacturing industry, with a focus on energy-efficient technologies. His patents and collaborations reflect his commitment to innovation and excellence in this critical field.