logo

For the Inventor, By the Inventor

Shizuoka, Japan

Naotsugu Muro

USPTO Granted Patents = 29 

 

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Kanagawa, JP (2010 - 2012)
  • Minami-ashigara, JP (2012 - 2013)
  • Haibara-gun, JP (2012 - 2021)
  • Shizuoka, JP (2014 - 2023)

Company Filing History:

goldMedal29 out of 16,093 
 
Fujifilm Corporation
 patents

Years Active: 2010-2023

Loading Chart...
Loading Chart...
29 patents (USPTO):Explore Patents
1. 11848249 - Manufacturing method for thermal conductive layer, manufacturing method for laminate, and manufacturing method for semiconductor device (2023-12-19),
2. 11112693 - Curable coloring composition, color filter, solid-state imaging device, image display device, and method for producing cured film (2021-09-07),
3. 10641935 - Coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device (2020-05-05),
4. 10634997 - Coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device (2020-04-28),
5. 10435794 - Etching method, etching solution used in same, and production method for semiconductor substrate product (2019-10-08),
6. 10409158 - Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging element, and image display device (2019-09-10),
7. 9664827 - Colored composition, method of producing color filter using the same, color filter and solid-state imaging device (2017-05-30),
8. 9632222 - Method for manufacturing a color filter, color filter and solid-state imaging device (2017-04-25),
9. 9618665 - Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device (2017-04-11),
10. 9605101 - Pigment multimer, coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, and image display device (2017-03-28),
11. 9558953 - Etching method, and method of producing semiconductor substrate product and semiconductor device using the same (2017-01-31),
12. 9548217 - Etching method of semiconductor substrate, and method of producing semiconductor device (2017-01-17),
13. 9465142 - Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module (2016-10-11),
14. 9442373 - Method of producing color filter and solid-state imaging device having colored composition containing color agent (2016-09-13),
15. 9442231 - Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device (2016-09-13),

Title: Naotsugu Muro: Pioneering Inventor from Shizuoka

Introduction: Naotsugu Muro is a distinguished inventor hailing from Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naotsugu Muro's recent patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Naotsugu Muro has held key positions in leading research institutions and technology companies, where he has spearheaded numerous projects that have revolutionized the industry.

Collaborations: Throughout his career, Naotsugu Muro has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge-sharing that has led to remarkable advancements in various technological domains.

Conclusion: Naotsugu Muro's relentless pursuit of innovation and his passion for creating transformative technologies have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…