The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
May. 13, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Naotsugu Muro, Shizuoka, JP;
Tetsuya Kamimura, Shizuoka, JP;
Tadashi Inaba, Shizuoka, JP;
Atsushi Mizutani, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01); C09K 13/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32134 (2013.01); C09K 13/08 (2013.01); H01L 21/31144 (2013.01);
Abstract
An etching method containing, at the time of processing a substrate having a first layer containing titanium nitride (TiN) and a second layer containing a transition metal, selecting a substrate in which a surface oxygen content of the first layer is from 0.1 to 10% by mole, and applying an etching liquid containing a hydrofluoric acid compound and an oxidizing agent to the substrate and thereby removing the first layer.