Utsunomiya, Japan

Naoto Ohkawa

This inventor holds 2 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoto Ohkawa. Retrieved from https://idiyas.com/inventor/naoto-ohkawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Naoto Ohkawa: Innovator in Exposure Technology

Introduction

Naoto Ohkawa is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of exposure technology, particularly in the manufacturing processes of various articles. With a total of 2 patents to his name, Ohkawa's work has been instrumental in advancing the capabilities of exposure apparatuses.

Latest Patents

Ohkawa's latest patents include innovative technologies that enhance the precision and efficiency of exposure methods. The first patent describes an exposure apparatus designed to expose a substrate. This apparatus features a measurement unit that measures the height of the substrate at multiple points. The control unit then adjusts the substrate's height based on these measurements, allowing for more accurate exposure of shot regions. The second patent outlines a method for obtaining the position of a second shot region adjacent to a first shot region. This method involves detecting the positions of specific marks within the shot regions to ensure precise alignment during the exposure process.

Career Highlights

Naoto Ohkawa is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop cutting-edge technologies that are widely used in the industry. Ohkawa's inventions have not only improved manufacturing processes but have also contributed to the overall advancement of exposure technology.

Collaborations

Ohkawa has collaborated with notable colleagues such as Masatoshi Endo and Akihiko Kawamura. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Naoto Ohkawa's contributions to exposure technology through his patents and work at Canon Kabushiki Kaisha highlight his role as a key innovator in the field. His inventions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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