This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Naotaka Noro: Innovator in Semiconductor Technology
Introduction
Naotaka Noro is a prominent inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for film formation.
Latest Patents
Noro holds a patent for a "Method for forming RuSi film and substrate processing system." This method involves adsorbing silicon in a recess formed in a substrate that includes an insulating film. The process includes supplying a silicon-containing gas to the substrate, forming a Ru film in the recess by using a Ru-containing precursor, and ultimately forming a RuSi film by supplying additional silicon-containing gas.
Career Highlights
Noro is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing the technology used in substrate processing systems.
Collaborations
Noro has collaborated with Tadahiro Ishizaka, contributing to the development of innovative solutions in their field.
Conclusion
Naotaka Noro's contributions to semiconductor technology through his patented methods highlight his role as an influential inventor. His work continues to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile