This inventor holds 2 USPTO granted patents. Top assignees: Kyoto University, Toshiba Mitsubishi-Electric Industrial Systems Corporation. Active years: 2015-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2015-2017
Title: Naoki Kameyama: Innovator in Metal Oxide Film Technology
Introduction
Naoki Kameyama is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of material science, particularly in the development of methods for forming metal oxide films. With a total of two patents to his name, Kameyama's work has the potential to enhance production efficiency in various applications.
Latest Patents
Kameyama's latest patents focus on innovative methods for forming metal oxide films. The first patent describes a method that increases production efficiency while maintaining low resistance in the metal oxide film. This method involves misting a solution containing a metallic element and ethylenediamine while heating a substrate. The misted solution is then supplied onto the heated substrate's main surface. His second patent aims to further improve production efficiency while ensuring low resistance in the metal oxide film. This method utilizes a mist formed from a solution containing a metallic element and ammonia, which is also applied to a heated substrate.
Career Highlights
Throughout his career, Naoki Kameyama has worked with notable organizations, including Toshiba Mitsubishi-Electric Industrial Systems Corporation and Kyoto University. His experience in these institutions has allowed him to refine his expertise in material science and innovation.
Collaborations
Kameyama has collaborated with several professionals in his field, including Hiroyuki Orita and Takahiro Shirahata. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Naoki Kameyama is a distinguished inventor whose work in metal oxide film technology has the potential to revolutionize production processes. His innovative methods and collaborations highlight his commitment to advancing material science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile