The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Sep. 02, 2009
Applicants:

Hiroyuki Orita, Tokyo, JP;

Takahiro Shirahata, Tokyo, JP;

Akio Yoshida, Tokyo, JP;

Shizuo Fujita, Kyoto, JP;

Naoki Kameyama, Kyoto, JP;

Toshiyuki Kawaharamura, Kochi, JP;

Inventors:

Hiroyuki Orita, Tokyo, JP;

Takahiro Shirahata, Tokyo, JP;

Akio Yoshida, Tokyo, JP;

Shizuo Fujita, Kyoto, JP;

Naoki Kameyama, Kyoto, JP;

Toshiyuki Kawaharamura, Kochi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 18/12 (2006.01); H01L 31/18 (2006.01); H01G 9/20 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1216 (2013.01); C23C 18/1258 (2013.01); C23C 18/1291 (2013.01); H01L 31/1884 (2013.01); H01G 9/2031 (2013.01); H01L 29/7869 (2013.01); Y02E 10/50 (2013.01);
Abstract

The present method of forming a metal oxide film can increase production efficiency while maintaining the low resistance of the metal oxide film. The present method of forming a metal oxide film includes first misting a solution containing a metallic element and ethylenediamine; meanwhile, heating a substrate; and then, supplying the misted solution onto a first main surface of the substrate.


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