The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Apr. 20, 2009
Applicants:

Hiroyuki Orita, Tokyo, JP;

Takahiro Shirahata, Tokyo, JP;

Akio Yoshida, Tokyo, JP;

Shizuo Fujita, Kyoto, JP;

Naoki Kameyama, Kyoto, JP;

Inventors:

Hiroyuki Orita, Tokyo, JP;

Takahiro Shirahata, Tokyo, JP;

Akio Yoshida, Tokyo, JP;

Shizuo Fujita, Kyoto, JP;

Naoki Kameyama, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
C23C 16/407 (2013.01); C23C 16/405 (2013.01); C23C 16/448 (2013.01); C23C 16/4486 (2013.01);
Abstract

The present invention aims at providing a method for forming a metal oxide film which can further improve the production efficiency while maintaining low resistance of a metal oxide film formed thereby. In the method for forming a metal oxide film of the present invention, a solution () containing a metallic element and ammonia () is formed into a mist. Meanwhile, a substrate () is heated. Then, the solution () formed into a mist is supplied onto a first main surface of the substrate () being heated.


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