Naohisa Tamada

Title: Naohisa Tamada: Innovator in Photomask Technology

Introduction

Naohisa Tamada is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His work focuses on methods that enhance the precision and efficiency of electronic device manufacturing.

Latest Patents

Tamada's latest patents include a "Method of focus monitoring and manufacturing method for an electronic device." This invention features a photomask designed for focus monitoring, which includes a substrate that allows exposure light to pass through. The unit mask structure for focus monitoring consists of two patterns formed on the substrate's surface, along with a light-blocking film that has a rear surface pattern. This design enables the differentiation of incident directions of exposure light, facilitating accurate position measurement. Another notable patent is the "Method of pattern layout of a photomask for pattern transfer." This method involves positioning main patterns for transferring images to photosensitive films, along with auxiliary patterns that do not substantially transfer images. The innovative layout simplifies the inspection of photomasks for defects while enhancing resolution.

Career Highlights

Throughout his career, Naohisa Tamada has worked with notable companies such as Renesas Technology Corporation and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in photomask technology and electronic device manufacturing.

Collaborations

Tamada has collaborated with esteemed colleagues, including Yuki Miyamoto and Shuji Nakao. These partnerships have further enriched his work and innovations in the field.

Conclusion

Naohisa Tamada's contributions to photomask technology and electronic device manufacturing have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing technology.