The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Jun. 04, 2004
Shuji Nakao, Hyogo, JP;
Yuki Miyamoto, Hyogo, JP;
Naohisa Tamada, Hyogo, JP;
Shinroku Maejima, Hyogo, JP;
Shuji Nakao, Hyogo, JP;
Yuki Miyamoto, Hyogo, JP;
Naohisa Tamada, Hyogo, JP;
Shinroku Maejima, Hyogo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is λ, L/λ is 10, or greater.