Miura, Japan

Naohiro Shimizu

USPTO Granted Patents = 14 


Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 162(Granted Patents)


Location History:

  • Kanagawa, JP (1995)
  • Kanagawa-Ken, JP (1996 - 1997)
  • Nagoya, JP (2003 - 2013)
  • Aichi, JP (2013)
  • Miura, JP (2002 - 2016)

Company Filing History:


Years Active: 1995-2016

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14 patents (USPTO):Explore Patents

Title: The Innovative Journey of Naohiro Shimizu

Introduction

Naohiro Shimizu, an accomplished inventor based in Miura, Japan, has made significant contributions to the field of technology through his innovative ideas and inventions. With a total of 14 patents to his name, Shimizu has played a pivotal role in developing cutting-edge solutions that cater to various industrial applications.

Latest Patents

Among Shimizu's latest inventions is a notable plasma treatment method. This method involves treating at least a surface of a target object using a plasma treatment apparatus that includes a discharge electrode section. This section is designed to facilitate electric discharge through high voltage pulse supply from a pulse power supply. In this process, fluid, including nitrogen, is supplied into the discharge electrode section to generate plasma via electric discharge. The resultant active species and fluid are then applied to the target object, where the flow rate of the fluid is maintained between 20 mm/s to 500 mm/s. Notably, the electrical energy per area provided by the pulse power supply is 1.4×10(J/cm) or more, with a specific separation distance from the discharge electrode center to the target object ranging from 3 mm to 1700 mm.

Another significant innovation from Shimizu is the Buried Gate Static Induction Thyristor. This semiconductor device includes a semiconductor substrate, a cathode, an anode, and a gate electrode. The design features a cathode segment and an anode segment positioned correspondingly to each terminal. Additionally, a plurality of embedded segments and a takeoff segment are incorporated, connecting the gate electrode to the embedded segments, alongside a channel segment that resides between adjacent embedded segments. This intricate design showcases Shimizu's expertise in semiconductor technology.

Career Highlights

Shimizu's career is marked by his work with prominent companies such as NGK Insulators, Inc. and Toyo Denki Seizo Kabushiki Kaisha. His role in these organizations allowed him to expand his knowledge and apply his innovative concepts in practical settings, contributing greatly to their technological advancements.

Collaborations

Throughout his professional journey, Shimizu has collaborated with talented individuals including Yuichiro Imanishi and Kimihiro Muraoka. These partnerships have fostered a creative environment that has led to the successful development of pioneering technologies and products.

Conclusion

Naohiro Shimizu's contributions as an inventor exemplify the spirit of innovation and the impact of dedicated research and development in technology. With numerous patents and a history of collaboration with industry leaders, Shimizu continues to influence the landscape of modern technology, leaving a lasting legacy in the field of inventions.

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