Company Filing History:
Years Active: 2017-2023
Title: Naohiko Yoshihara: Innovator in Substrate Processing Technology
Introduction
Naohiko Yoshihara is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 14 patents. His innovative approaches have advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
Yoshihara's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method involves supplying a first processing liquid onto the upper surface of a substrate held in a horizontal state, forming a liquid film that entirely covers the surface. By heating the substrate, a vapor layer of the first processing liquid is created, which aids in removing extraneous matters from the substrate's surface. The substrate treatment apparatus he developed includes various components such as a substrate holding unit, a rotator, and multiple nozzles for supplying different liquids. This apparatus is designed to enhance the efficiency of substrate treatment processes.
Career Highlights
Yoshihara has had a successful career at Screen Holdings Co., Ltd., where he has been instrumental in developing cutting-edge technologies. His work has not only contributed to the company's growth but has also positioned it as a leader in the substrate processing sector.
Collaborations
Throughout his career, Yoshihara has collaborated with notable colleagues, including Manabu Okutani and Kenji Kobayashi. These partnerships have fostered innovation and have led to the successful development of various technologies in the field.
Conclusion
Naohiko Yoshihara's contributions to substrate processing technology have made a significant impact on the industry. His innovative patents and collaborative efforts continue to drive advancements in this critical area of technology.
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