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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9728443 B1

PDFFull Text
Date of Patent:
Aug. 08, 2017

Filed:

Feb. 26, 2015

Substrate processing apparatus and substrate processing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Naohiko Yoshihara, Kyoto, JP;

Kenji Kobayashi, Kyoto, JP;

Manabu Okutani, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd., , JP;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Yewebdar Tadesse

Int. Cl.
CPC ...
B05C 13/02 (2006.01); B05C 11/02 (2006.01); B05C 11/00 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); B05C 11/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68764 (2013.01); B05C 11/08 (2013.01); H01L 21/6708 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01); H01L 21/68742 (2013.01);
Abstract

A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.

Find Patent Forward Citations

Yoshihara, Naohiko. (2017). Substrate processing apparatus and substrate processing method (U.S. Patent No. 9728443). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9728443

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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