The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Dec. 27, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Manabu Okutani, Kyoto, JP;

Tsutomu Osuka, Kyoto, JP;

Katsuei Higashi, Kyoto, JP;

Hiroshi Abe, Kyoto, JP;

Naohiko Yoshihara, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6715 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); H01L 21/67098 (2013.01);
Abstract

In substrate processing, by supplying a first processing liquid onto an upper surfaceof a substrateheld in a horizontal state, a liquid filmof the first processing liquid which entirely covers the upper surfaceis formed. Further, by heating the substrate, a vapor layerof the first processing liquid is formed between the upper surfaceand the liquid filmof the first processing liquid on the upper surface. Then, by supplying a second processing liquid onto the upper surfaceof the substrate, the liquid filmof the first processing liquid is removed from the upper surface. It is thereby possible to appropriately remove extraneous mattersfrom the upper surfaceof the substrate, which are taken in the liquid filmof the first processing liquid as the vapor layeris formed.


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