Katsuei Higashi

Title: Innovations by Katsuei Higashi

Introduction

Katsuei Higashi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His work focuses on methods and devices that enhance the efficiency and effectiveness of substrate treatment.

Latest Patents

Higashi's latest patents include a substrate treatment method and a substrate treatment device. The substrate processing method involves a substrate holding step where the substrate is held at a specific position surrounded by a cylindrical guard. It includes a processing liquid supplying step that processes the substrate's surface while rotating it. An image acquiring step captures images of both the processed surface and the inner wall of the guard, allowing for monitoring of luminance values to detect the end of the processing time. The substrate processing apparatus patent describes a method where a first processing liquid forms a liquid film on the substrate's upper surface. By heating the substrate, a vapor layer is created, which aids in removing extraneous materials from the surface when a second processing liquid is applied.

Career Highlights

Katsuei Higashi is associated with Screen Holdings Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the methods used in this field, contributing to improved manufacturing processes.

Collaborations

Higashi collaborates with notable colleagues such as Manabu Okutani and Tsutomu Osuka, enhancing the innovative capabilities of his team.

Conclusion

Katsuei Higashi's contributions to substrate processing through his patents and collaborations highlight his role as a significant inventor in the field. His innovative methods continue to influence the industry positively.