The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2025
Filed:
Oct. 29, 2021
Screen Holdings Co., Ltd., Kyoto, JP;
Toru Endo, Kyoto, JP;
Hideji Naohara, Kyoto, JP;
Yuji Okita, Kyoto, JP;
Katsuei Higashi, Kyoto, JP;
Takahiro Yamaguchi, Kyoto, JP;
Ryuta Tsukahara, Kyoto, JP;
Akira Ishimaru, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A substrate processing method includes a substrate holding step of holding a substrate at a holding position surrounded by a cylindrical guard, a processing liquid supplying step of supplying a processed surface of the substrate with a processing liquid with which the processed surface of the substrate is processed while rotating the substrate held at the holding position about a rotation axis passing through a central portion of the substrate, an image acquiring step of acquiring an image of the processed surface of the substrate and an image of an inner wall surface of the guard while supplying the processing liquid to the processed surface of the substrate, and a detecting step of monitoring luminance values of the images obtained in the image acquiring step, and detecting a processing end time point at which processing of the processed surface of the substrate with the processing liquid is ended.