Location History:
- Tokyo, JP (1994)
- Ooita, JP (1996)
- Ooita-ken, JP (1999)
Company Filing History:
3 out of 52,766 
1 out of 51 
Years Active: 1994-1999
Title: The Innovative Contributions of Naohiko Yasuhisa
Introduction
Naohiko Yasuhisa, hailing from Ooita, Japan, is an accomplished inventor known for his significant contributions to the field of semiconductor technology. With a remarkable total of three patents to his name, Yasuhisa has made strides in improving the processing methods of semiconductor substrates, addressing crucial aspects in the manufacturing processes.
Latest Patents
Yasuhisa's most recent innovations include two notable patents focused on semiconductor substrate processing. The first patent, titled "Semiconductor substrate and method of processing the same," describes a method that involves subjecting a semiconductor substrate to heat treatment under a gaseous atmosphere at temperatures exceeding 1100°C in a non-oxidizing atmosphere. The process is carefully structured to include preliminary heat treatments within a defined temperature and time range, ensuring optimal substrate quality.
The second patent, "Method for heat treating a semiconductor substrate to reduce defects," similarly emphasizes high-temperature heat treatment processes to minimize defects in semiconductor substrates. It outlines the importance of the preliminary heat treatments and their corresponding parameters, visualized in a graph that connects specific points of temperature and time, optimized for enhancing semiconductor performance.
Career Highlights
Throughout his career, Yasuhisa has worked with leading companies in the semiconductor industry, including Kabushiki Kaisha Toshiba and Tokyo Electron Sagami Limited. His expertise in semiconductor processing has undoubtedly contributed to advancements in manufacturing practices and technology.
Collaborations
Yasuhisa has had the opportunity to collaborate with esteemed colleagues, including Akihito Yamamoto and Souichi Nadahara. This collaboration underscores Yasuhisa's role in a network of innovators dedicated to pushing the boundaries of semiconductor technology.
Conclusion
Naohiko Yasuhisa's contributions to semiconductor substrate processing represent significant advancements in the field. Through his patents, he has paved the way for enhanced manufacturing techniques that improve the quality and reliability of semiconductor devices. His work continues to inspire innovation within the industry, reflecting his commitment to technological progression.