Myoung-Ho Jung

Title: Myoung-Ho Jung: Innovator in Pattern Formation Technology

Introduction

Myoung-Ho Jung is a notable inventor based in Yonging-si, South Korea. He has made significant contributions to the field of pattern formation technology, holding three patents to his name. His work primarily focuses on innovative methods that enhance the efficiency and effectiveness of pattern formation processes.

Latest Patents

One of Myoung-Ho Jung's latest patents involves a method of forming a pattern. This method includes the formation of a first organic polymer layer on a substrate that has an underlying layer. Subsequently, a second organic polymer layer is created, which features an opening that partially exposes the first organic polymer layer. Following this, a silicon-containing polymer layer is applied to cover the opening on the second organic polymer layer. The silicon-containing polymer layer undergoes oxidation, while both the second and first organic polymer layers are ashed using oxygen plasma, resulting in a pattern with an anisotropic shape. The underlying layer is then etched using the silicon-containing polymer layer and the first organic polymer layer as an etching mask to finalize the pattern.

Career Highlights

Myoung-Ho Jung is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop new technologies. His work at Samsung has positioned him as a key player in advancing the company's capabilities in pattern formation.

Collaborations

Throughout his career, Myoung-Ho Jung has collaborated with talented individuals such as Sang-Gyun Woo and Cha-Won Koh. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Myoung-Ho Jung's contributions to pattern formation technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of materials and processes that are crucial for modern technological applications.