The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2008
Filed:
Feb. 26, 2004
Applicants:
Hyun-woo Kim, Suwon, KR;
Jin Hong, Gyeonggi-do, KR;
Myoung-ho Jung, Yongin, KR;
Sang-gyun Woo, Yongin, KR;
Inventors:
Hyun-Woo Kim, Suwon, KR;
Jin Hong, Gyeonggi-do, KR;
Myoung-Ho Jung, Yongin, KR;
Sang-Gyun Woo, Yongin, KR;
Assignee:
Samsung Electronics Co. Ltd, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming an underlayer of a bi-layer resist including forming a blended material by blending a polymer having an aromatic group and a methacrylate polymer, and coating a substrate with the blended material. The blended material coated on the substrate is irradiated to form an underlayer. The polymer having the aromatic group may be a novolac polymer or a naphthalene polymer.