Location History:
- Seoul, KR (2017)
- Seongnam-si, KR (2021)
Company Filing History:
2 out of 1,142 
1 out of 27,040 
Years Active: 2017-2021
Title: Innovator MunPyo Hong: A Luminary in Plasma Etching and Display Panel Manufacturing
Introduction
MunPyo Hong, a prominent inventor based in Seongnam-si, Korea, has made significant contributions to the field of semiconductor technology. With two patents to his name, he has excelled in developing innovative methods that improve manufacturing processes for display panels and plasma etching.
Latest Patents
One of Hong's latest patents is the Copper Plasma Etching Method. This invention outlines a plasma etching technique where a substrate is placed on a susceptor within a process chamber. The method involves supplying an etching gas, including hydrogen chloride, into the chamber to plasma-etch a conductor layer made of copper. A notable aspect of this innovation is the maintenance of the susceptor's temperature at 10°C or below during the etching process, enhancing the overall effectiveness and efficiency.
Another remarkable patent by Hong is the Apparatus for Forming Gas Blocking Layer and Method Thereof. This apparatus is designed with a vacuum chamber that accommodates both chemical vapor deposition and sputtering processes. It features a holding unit for mounting a target object and incorporates a neutral particle generation unit that creates a high-density neutral particle beam. This invention is significant in the development of organic/inorganic mixed multilayer gas blocking layers, which are crucial for advancing display technologies.
Career Highlights
MunPyo Hong's career has been marked by his association with renowned organizations. He has worked at Samsung Display Co., Ltd., where he contributed to innovative projects in display technologies. Additionally, he has been affiliated with the Korea University Research and Business Foundation, Sejong Campus, where he engaged in research and development activities that further his expertise in the field.
Collaborations
Throughout his career, Hong has collaborated with several talented individuals, among them Sang Gab Kim and Hyun Min Cho. These partnerships have been instrumental in driving forward innovative solutions and enhancing research outcomes in his projects.
Conclusion
MunPyo Hong stands as a testament to the spirit of innovation in the semiconductor and display technology sectors. His patents, ranging from plasma etching methods to gas blocking layer formation technologies, highlight his commitment to advancing manufacturing processes. As he continues to develop groundbreaking solutions, the impact of his work will undoubtedly resonate within the industry for years to come.