Mun-Mo Jeong

Title: The Innovations of Mun-Mo Jeong

Introduction

Mun-Mo Jeong is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor device with gate spacer of positive slope and fabrication method thereof." This invention provides a semiconductor device and a fabrication method that includes processes such as forming multiple gates on a silicon substrate and creating a gate spacer with a positive slope at the edge. The method also involves depositing a polysilicon layer and forming an inter-insulation layer to fill openings in the substrate. Another notable patent is "Bitline of semiconductor device having stud type capping layer and method for fabricating the same." This invention features a bitline structure with a stud type capping layer, which enhances process margins and reduces parasitic capacitance.

Career Highlights

Mun-Mo Jeong has worked with leading companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and LG Semicon Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in semiconductor fabrication.

Collaborations

Throughout his career, Mun-Mo Jeong has collaborated with notable professionals in the field, including Chang-Huhn Lee and Makoto Yoshida. These collaborations have contributed to the advancement of semiconductor technologies and the successful development of his patented inventions.

Conclusion

Mun-Mo Jeong's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.