Ellicott City, MD, United States of America

Mu-San Chen


Average Co-Inventor Count = 5.0

ph-index = 7

Forward Citations = 395(Granted Patents)


Location History:

  • Ellicott, MD (US) (1995 - 1996)
  • Elicott City, MD (US) (1997 - 2000)
  • Ellicott City, MD (US) (1996 - 2004)

Company Filing History:


Years Active: 1995-2004

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10 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Mu-San Chen

Introduction: Mu-San Chen is a prolific inventor based in Ellicott City, MD, with a remarkable portfolio of 10 patents. His groundbreaking work primarily focuses on advancements in beam lithography and mask fabrication, significantly impacting the field of electronic devices.

Latest Patents: One of Mu-San Chen's latest inventions is an anti-charging layer for beam lithography and mask fabrication. This innovative invention addresses the challenges of beam displacement, enhancing pattern placement accuracy during fabrication. It plays a vital role in the production of high-resolution lithographic masks and enables precision in beam direct-write lithography applications. The anti-charging layer utilizes metal films bound to metal ligating self-assembled monolayers (SAMs) as discharge layers, marking a significant advancement in the lithography process.

Career Highlights: Throughout his career, Mu-San Chen has contributed to several esteemed organizations, including the United States of America, as represented by the Secretary of the Navy, and Geo-Centers, Inc. His innovative approaches and inventions have set new standards in the lithography field, showcasing his expertise and commitment to advancing technology.

Collaborations: Mu-San Chen has collaborated with notable professionals in his field, including Jeffrey M. Calvert and Walter J. Dressick. These partnerships have fostered a supportive environment for innovation and the sharing of ideas, enhancing the quality and impact of their collective research.

Conclusion: Mu-San Chen stands out as an influential inventor whose work continues to shape the landscape of beam lithography and electronic device fabrication. His advancements in technology are a testament to his dedication and ingenuity, paving the way for future innovations in the industry. Keep an eye on his continued contributions as he pushes the boundaries of what is possible in his field.

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