Osaka, Japan

Motoi Nakao


Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Miyanohigashi-machi, Kissyoin, Minami-ku, Kyoto, JP (2000)
  • Osaka, JP (2004 - 2008)

Company Filing History:

goldMedal5 out of 17 
 
Osaka Prefecture
 patents
silverMedal5 out of 776 
 
Hosiden Corporation
 patents
bronzeMedal2 out of 832,880 
Other
 patents
where one patent can have more than one assignee

Years Active: 2000-2008

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Innovations by Inventor Motoi Nakao from Osaka

Introduction

Motoi Nakao is a distinguished inventor based in Osaka, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of seven patents, Nakao has paved the way for advancements in electronic-optical devices and semiconductor substrates.

Latest Patents

Nakao's latest innovations include a manufacturing method for a monocrystalline gallium nitride localized substrate. This innovation facilitates the production of electronic-optical united devices that can mix electronic and optical components on the same silicon substrate. The method involves the local growth of monocrystalline gallium nitride on a silicon substrate by first forming silicon carbide, with silicon nitride serving as a mask during the growth process.

Additionally, he has developed a manufacturing apparatus for a buried insulating layer-type semiconductor silicon carbide substrate. This patent outlines a method where an SOI substrate, featuring a surface silicon layer of a predetermined thickness and a buried insulator, is placed in a heating furnace. By increasing the atmospheric temperature and supplying a mixed gas of hydrogen and hydrocarbon, the surface silicon layer is transformed into a single crystal silicon carbide thin film, showcasing Nakao's expertise in optimizing semiconductor materials.

Career Highlights

Through his career, Motoi Nakao has made impactful contributions while working at notable organizations, including Osaka Prefecture and Hosiden Corporation. His experience in these institutions has allowed him to hone his skills in semiconductor technology, leading to his valuable patents.

Collaborations

Nakao has collaborated with esteemed colleagues, including Katsutoshi Izumi and Yoshiaki Ohbayashi. Their joint efforts have further enriched the innovation landscape, leveraging their combined expertise to push the boundaries of semiconductor research and development.

Conclusion

In conclusion, Motoi Nakao's work exemplifies the power of innovation in the field of semiconductor technology. With his seven patents paving the way for significant advancements, Nakao continues to inspire future generations of inventors and researchers. His contributions stand as a testament to the impact that dedicated inventors can have on technology and society.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…