Crolles, France

Morgane Logiou

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 3.5

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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3 patents (USPTO):Explore Patents

Title: Morgane Logiou: Innovator in Ferroelectric Materials

Introduction

Morgane Logiou is a notable inventor based in Crolles, France. He has made significant contributions to the field of ferroelectric materials, holding a total of 3 patents. His work focuses on innovative methods for preparing and manufacturing thin layers of ferroelectric materials, which have important applications in various technologies.

Latest Patents

Morgane Logiou's latest patents include a method for preparing a thin layer of ferroelectric material. This method involves implanting light species in a ferroelectric donor substrate to form an embrittlement plane and define a first layer. The process includes assembling the donor substrate with a support substrate using a dielectric assembly layer and fracturing the donor substrate at the embrittlement plane. Additionally, he has developed a method for manufacturing a structure that comprises a thin layer transferred onto a support with a charge trapping layer. This method includes preparing the support, joining it to a donor substrate, and removing part of the donor substrate to form the thin layer, all while maintaining specific hydrogen concentrations.

Career Highlights

Morgane Logiou is currently employed at Soitec, a company known for its advanced semiconductor materials. His work at Soitec has allowed him to push the boundaries of ferroelectric material applications. His innovative approaches have garnered attention in the field, contributing to advancements in technology.

Collaborations

Morgane collaborates with talented individuals such as Alexis Drouin and Isabelle Huyet. Their combined expertise fosters a creative environment that enhances the development of new technologies.

Conclusion

Morgane Logiou is a prominent inventor whose work in ferroelectric materials is paving the way for future innovations. His patents and collaborations reflect his commitment to advancing technology in this critical field.

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