Mordechai Rokni

Title: The Innovations of Mordechai Rokni

Introduction

Mordechai Rokni is an accomplished inventor based in Jerusalem, Israel. He has made significant contributions to the field of radiation sources, particularly through his innovative work on dense plasma focus technology. His expertise and creativity have led to advancements that enhance the efficiency of extreme ultraviolet (EUV) radiation production.

Latest Patents

Rokni holds a patent for a dense plasma focus radiation source. This invention is designed for generating EUV radiation using Lithium vapor and features a coaxially disposed anode and cathode. The patent includes methods and apparatuses aimed at improving the efficiency of EUV radiation production. Additionally, it addresses the protection, cooling, and longevity of the anode and cathode, as well as shielding collecting optics from debris and pressure disturbances within the discharge chamber. The invention also outlines a method for feeding Lithium into the discharge chamber.

Career Highlights

Mordechai Rokni is currently associated with Cymer, Inc., a company known for its cutting-edge technology in the semiconductor industry. His work at Cymer has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in lithography and radiation sources.

Collaborations

Rokni has collaborated with notable colleagues, including Jonah H Jacob and Joseph A Mangano. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Mordechai Rokni's contributions to the field of dense plasma focus radiation sources exemplify the impact of innovation in technology. His patent and work at Cymer, Inc. highlight his role as a key figure in advancing EUV radiation production. Through his collaborations and inventive spirit, Rokni continues to push the boundaries of what is possible in his field.