The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

May. 21, 2003
Applicants:

Jonah Jacob, Brookline, MA (US);

Joseph A. Mangano, Arlington, VA (US);

James Moran, Charlestown, MA (US);

Alexander Bykanov, Belmont, MA (US);

Rodney Petr, Acton, MA (US);

Mordechai Rokni, Jerusalem, IL;

Inventors:

Jonah Jacob, Brookline, MA (US);

Joseph A. Mangano, Arlington, VA (US);

James Moran, Charlestown, MA (US);

Alexander Bykanov, Belmont, MA (US);

Rodney Petr, Acton, MA (US);

Mordechai Rokni, Jerusalem, IL;

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.


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