Suwon, South Korea

Moo Hyun Koh

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Dct Material LLC, Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moo Hyun Koh. Retrieved from https://idiyas.com/inventor/moo-hyun-koh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Moo Hyun Koh: Innovator in Semiconductor Photoresist Technology

Introduction

Moo Hyun Koh is an inventor based in Suwon-si, South Korea. He is focused on advancements in semiconductor technology, particularly in the area of photoresist compositions. Although he currently holds no granted patents, his work is significant in the field of semiconductor manufacturing.

Latest Patent Applications

Moo Hyun Koh has submitted several notable patent applications. One of his latest applications is for a "SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION." This application describes a semiconductor photoresist composition that includes an organometallic compound and a solvent, along with a method for forming patterns using this composition. Another application is titled "PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE." This application details a photoresist composition that includes an organometallic compound with a central metal and two ligand compounds, aimed at improving photosensitivity while ensuring stability.

Conclusion

Moo Hyun Koh is an emerging inventor whose contributions to semiconductor photoresist technology are noteworthy. His latest patent applications reflect his innovative approach to enhancing semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…