Momoko Munakata

Title: Innovations of Momoko Munakata

Introduction

Momoko Munakata is a notable inventor based in Tokyo, Japan. She has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions and methods for forming resist patterns. With a total of 2 patents, her work has implications for various applications in electronics and manufacturing.

Latest Patents

Munakata's latest patents include a method for forming a resist pattern and a photosensitive resin composition for projection exposure. The method aims to create a resist pattern with favorable shapes, reduced resist footing, and improved adherence and aspect ratio. The process involves forming a photosensitive resin layer on a substrate, exposing it to active light, and developing the layer to remove unexposed parts. The photosensitive resin composition comprises a binder polymer, a photopolymerizing compound, and a photopolymerization initiator, ensuring high light transmittance at a wavelength of 365 nm.

Career Highlights

Momoko Munakata is currently employed at Hitachi Chemical Company, Ltd., where she continues to innovate in her field. Her work has been instrumental in advancing technologies related to printed wiring boards and lead frames.

Collaborations

One of her notable collaborators is Masakazu Kume, who has worked alongside her on various projects.

Conclusion

Momoko Munakata's contributions to the field of materials science and her innovative patents highlight her role as a leading inventor in Japan. Her work continues to influence advancements in technology and manufacturing processes.