Company Filing History:
Years Active: 2020-2023
Title: Mollie Waller - Innovator in Semiconductor Processing
Introduction
Mollie Waller is a prominent inventor based in Corvallis, Oregon. She has made significant contributions to the field of semiconductor processing, particularly in the area of metal-containing resist compositions. With a total of three patents to her name, Mollie has established herself as a key figure in her industry.
Latest Patents
Mollie's latest patents focus on apparatuses and methods for reducing metal residue in the edge bead region from metal-containing resists. These innovations describe techniques for removing edge bead on a wafer associated with a resist coating. The methods involve applying a bead edge rinse solution along the wafer edge after spin coating with the metal-based resist composition. The edge bead solution includes an organic solvent and an additive, which can be a carboxylic acid, an inorganic fluorinated acid, or a tetraalkylammonium compound. Additionally, the methods may include applying a protective composition to the wafer prior to the edge bead rinse.
Career Highlights
Mollie Waller has been instrumental in advancing semiconductor processing technologies. Her work has led to improved methods for handling metal-containing resists, which are critical in the manufacturing of semiconductor devices. Her innovative approaches have garnered attention and recognition within the industry.
Collaborations
Throughout her career, Mollie has collaborated with notable colleagues, including Brian J Cardineau and