Location History:
- Newark, DE (US) (2015 - 2019)
- New Castle, DE (US) (2019 - 2022)
- New Catle, DE (US) (2023)
Company Filing History:
10 out of 309 
3 out of 4,658 
Years Active: 2015-2024
Title: **Innovator Spotlight: Mohammad T Islam**
Introduction
Mohammad T Islam, based in New Castle, Delaware, is a notable inventor with a remarkable portfolio of 10 patents. His contributions primarily focus on advancements in polishing pad technology, which play a significant role in chemical mechanical polishing processes.
Latest Patents
Among his latest innovations is the patent for a **CMP polishing pad with enhanced rate**. This invention features a polishing portion that comprises a polymer matrix along with rate-enhancing lamellar particles, incorporating phosphates or arsenates of group III-A or group IV-A metals. This combination proves to be effective in chemical mechanical polishing, particularly when utilizing a positively charged slurry.
Another significant patent is the **low-debris fluopolymer composite CMP polishing pad**. This invention offers a polymer-polymer composite polishing pad that is applicable for polishing or planarizing various substrates, including those used in semiconductor, optical, and magnetic industries. The unique structure consists of a polishing layer with a polishing surface, a polymeric matrix filled with gas or liquid microelements, and embedded fluoropolymer particles. The innovation ensures that diamond abrasive materials effectively cut the fluoropolymer, resulting in a reduced number of debris particles in the 1 to 10 micrometer range.
Career Highlights
Mohammad T Islam has an impressive career, having worked with prominent companies such as Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. His experiences in these organizations have greatly contributed to his expertise in material science and engineering applications related to polishing technologies.
Collaborations
Throughout his career, he has collaborated with notable professionals including George C Jacob and Nan-Rong Chiou. These collaborations have likely provided him with valuable insights and advancements in his field, further enhancing the effectiveness of his inventions.
Conclusion
In summary, Mohammad T Islam stands out as an innovative inventor specializing in CMP polishing technologies. His numerous patents highlight his commitment to enhancing processing techniques and material efficiency, marking him as a significant contributor to the field. As he continues to innovate, the impact of his work will be felt across various technological applications, reinforcing the importance of collaboration and innovation in advancing engineering solutions.