Tokyo, Japan

Mitsutoshi Koyama

This inventor holds 9 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1984-2004.


% Patents Active = 88.9

Average Co-Inventor Count = 2.8

ph-index = 6

Forward Citations = 136(Granted Patents)


Location History:

  • Koganei, JP (1984 - 1995)
  • Tokyo, JP (1992 - 1996)
  • Yokkaichi, JP (1999 - 2004)

Company Filing History:


Years Active: 1984-2004

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9 patents (USPTO):Explore Patents

Title: Mitsutoshi Koyama: Innovator in Semiconductor Technology

Introduction

Mitsutoshi Koyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on improving the reliability and efficiency of semiconductor devices.

Latest Patents

Koyama's latest patents include a method of making a semiconductor device featuring a multilayer metal film composed of titanium, titanium nitride, tungsten, and tungsten carbide. This innovative method enhances the formation of wiring layers using copper, ensuring better contact and reliability. Another notable patent involves a method for manufacturing semiconductor devices with pure copper wirings, which improves the performance of ultra high-speed devices by enhancing the degree of copper burying in high aspect ratio structures.

Career Highlights

Koyama is associated with Kabushiki Kaisha Toshiba, where he has been instrumental in advancing semiconductor technologies. His expertise in creating reliable wiring layers has positioned him as a key figure in the industry.

Collaborations

Koyama has worked alongside notable colleagues such as Koichi Takahashi and Naoto Miyashita, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion

Mitsutoshi Koyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the development of advanced semiconductor devices.

Profile summary based on public USPTO records.
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