This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2013.
Company Filing History:
Years Active: 2013
Title: Mitsuru Okamura: Innovator in Pattern Inspection Technology
Introduction
Mitsuru Okamura is a notable inventor based in Mito, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative patent. His work focuses on enhancing the reliability of pattern inspections, which are crucial in the production of semiconductor devices.
Latest Patents
Mitsuru Okamura holds a patent for a "Pattern Check Device and Pattern Check Method." This invention includes a pattern inspection apparatus that features a charge formation means, which generates an electron beam from a second electron source. The apparatus measures the current flowing in the substrate while the charge is formed on its surface. This technology allows for the optimal setting of precharge conditions before inspecting patterns formed during semiconductor manufacturing. The method ensures stable inspection results and prevents the degradation of inspection reliability.
Career Highlights
Mitsuru Okamura is associated with Hitachi High-Technologies Corporation, where he has been instrumental in developing advanced inspection technologies. His expertise in pattern inspection has positioned him as a key figure in the semiconductor industry.
Collaborations
Mitsuru has collaborated with notable colleagues, including Mari Nozoe and Hiroshi Miyai. Their combined efforts have contributed to the advancement of inspection technologies in semiconductor manufacturing.
Conclusion
Mitsuru Okamura's innovative work in pattern inspection technology has significantly impacted the semiconductor industry. His patent demonstrates a commitment to improving inspection reliability and efficiency.