Mitsuru Ohtsuka is a prominent inventor based in Yamato, Japan. He has made significant contributions to the field of electromagnetic radiation technologies, holding a total of 6 patents. His work focuses on the development of structures and devices that enhance the generation and detection of electromagnetic radiation.

Latest Patents

Ohtsuka's latest patents include a structure capable of use for the generation or detection of electromagnetic radiation and an optical semiconductor device. The fabrication method for this structure involves a multi-step process that regulates substrate temperature and gas ambience to achieve optimal results. Another notable patent is for a metal ion emission device, which utilizes a needle-like part to emit metal ions by applying voltage to a molten liquid metal. This innovative approach has potential applications in various fields, including materials processing and analysis.

Career Highlights

Mitsuru Ohtsuka has built a successful career at Canon Kabushiki Kaisha, where he has been instrumental in advancing the company's technological capabilities. His expertise in semiconductor devices and ion emission technologies has positioned him as a key figure in the industry.

Collaborations

Ohtsuka has collaborated with notable colleagues such as Seiichi Miyazawa and Natsuhiko Mizutani. These partnerships have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Mitsuru Ohtsuka's contributions to the field of electromagnetic radiation technologies are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology and enhancing the capabilities of devices in this domain.

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