Osaka, Japan

Mitsuru Hiroshima

USPTO Granted Patents = 18 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2013-2022

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18 patents (USPTO):Explore Patents

Title: **Mitsuru Hiroshima: A Pioneer in Plasma Processing Technologies**

Introduction: Mitsuru Hiroshima, an innovative inventor based in Osaka, Japan, has made significant contributions to the field of semiconductor and plasma processing technologies. With a remarkable portfolio of 18 patents, he has established himself as a leading figure in the industry.

Latest Patents: Among Mitsuru's latest inventions are groundbreaking patents that advance plasma processing methods. One notable patent is the Plasma Processing Apparatus and Plasma Processing Method. This invention entails a sophisticated plasma processing apparatus designed to perform plasma processing on substrates held on transport carriers. The apparatus features a transport mechanism, a position measuring section, a specialized plasma processing stage, and a control section that ensures optimal positional alignment during processing. Another significant patent is the Element Chip Manufacturing Method, which innovates semiconductor manufacturing by utilizing spray coating techniques for mask formation and employs plasma etching for precise wafer singulation.

Career Highlights: Mitsuru Hiroshima's career is marked by his impactful work at prestigious companies such as Panasonic Intellectual Property Management Co., Ltd. and Panasonic Corporation. Through his roles, he has contributed to the advancement of technology, focusing on enhancing the efficiency and effectiveness of semiconductor processes.

Collaborations: Throughout his career, Mitsuru has collaborated with talented individuals like Atsushi Harikai and Shogo Okita. These partnerships have fostered a creative environment that encourages innovation and the development of advanced technologies.

Conclusion: Mitsuru Hiroshima stands out as a prominent inventor who continually pushes the boundaries of plasma processing and semiconductor technology. His latest patents reflect his commitment to innovation and excellence, ensuring that his contributions will have a lasting impact on the industry. As technology evolves, forward-thinking inventors like Mitsuru will undoubtedly play a crucial role in shaping the future.

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