The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Apr. 23, 2014
Panasonic Corporation, Osaka, JP;
Nobuhiro Nishizaki, Osaka, JP;
Atsushi Harikai, Osaka, JP;
Tetsuhiro Iwai, Osaka, JP;
Mitsuru Hiroshima, Osaka, JP;
Abstract
The plasma processing apparatus is provided with a chamber, a plasma sourcewhich generates plasma inside the chamber, a stagewhich is provided inside the chamberand places a carrierthereon, a coverwhich is arranged above the stageto cover a holding sheetand a frameand has a windowwhich is formed on a central part thereof to penetrate the coverin the thickness direction, and a drive mechanismwhich changes the position of the coverrelative to the stagebetween a first position which is away from the stageand allows the carrierto be placed on and removed from the stageand a second position which allows the coverto cover the holding sheetand the frameof the carrierplaced on the stageand a substrateheld on the holding sheetto be exposed through the window. The windowof the coverallows an area of the substrate, the area being located on the inner side with respect to an outer edge area of the substrate, to be exposed therefrom.