This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Ebara Corporation. Active years: 1998-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Ebina, JP (1998 - 2001)
- Tokyo, JP (2002)
Company Filing History:
Years Active: 1998-2002
Title: Mitsunao Shibasaki: Innovator in Substrate Processing Technology
Introduction
Mitsunao Shibasaki is a prominent inventor based in Ebina, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 5 patents. His work focuses on developing advanced apparatuses and methods that enhance the quality and efficiency of thin-film deposition.
Latest Patents
One of his latest patents is an "Apparatus and method for processing substrate." This innovative substrate processing apparatus is designed to form thin films of high-dielectric or ferroelectric materials, such as barium/strontium titanates, or copper films for wiring. It features a gas ejection head that introduces at least two gases, including a material gas, and ejects them toward the substrate being processed. The gas ejection head is equipped with multiple gas passageways and temperature control devices to ensure precise control over the gases.
Another notable patent is the "Thin-film deposition apparatus." This compact apparatus promotes stable growth of high-quality thin films of uniform quality. It includes a vacuum-tight deposition chamber that houses a substrate holding device, an elevator for moving the substrate, and a gas showering head for delivering film-forming gas. The design incorporates a flow guiding member to optimize the deposition process.
Career Highlights
Mitsunao Shibasaki has established himself as a key figure in the substrate processing industry through his innovative designs and patents. His work has significantly impacted the efficiency and quality of thin-film deposition processes, making him a valuable asset to the field.
Collaborations
He has collaborated with notable coworkers, including Yukio Fukunaga and Kiwamu Tsukamoto, contributing to various projects that advance substrate processing technologies.
Conclusion
Mitsunao Shibasaki's contributions to substrate processing technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the future of thin-film deposition.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile