The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1998
Filed:
Mar. 19, 1997
Mitsunao Shibasaki, Ebina, JP;
Naoaki Ogure, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A spin dryer apparatus substrate such as a wafer can dry without degrading the cleanliness on both front and back sides of the wafer and without unnecessary cost increases. The spin dryer apparatus includes a holder section for holding a substrate in a substantially horizontal plane and defining a back space located beneath a back surface of the substrate, a driving section for rotating the holder section in the substantially horizontal plane, and a gas supply mechanism for supplying a clean gas into the back space. It is possible to avoid contamination of the back side of the substrate by preventing an ascending gas flow from approaching the substrate. A nozzle device is available for supplying a cleaning fluid on the substrate