The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Jan. 08, 1998
Applicant:
Inventors:

Kuniaki Horie, Yamato, JP;

Hidenao Suzuki, Fujisawa, JP;

Tsutomu Nakada, Yokohama, JP;

Takeshi Murakami, Tokyo, JP;

Yukio Fukunaga, Yokohama, JP;

Masahito Abe, Fujisawa, JP;

Hiroyuki Shinozaki, Fujisawa, JP;

Kiwamu Tsukamoto, Fujisawa, JP;

Mitsunao Shibasaki, Ebina, JP;

Yuji Araki, Fujisawa, JP;

Hiroyuki Ueyama, Fujisawa, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134105 ; 134108 ; 134902 ; 1341021 ;
Abstract

A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.


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