Mitsuharu Miyazaki

Title: Mitsuharu Miyazaki: Innovator in Photosensitive Resin Technology

Introduction

Mitsuharu Miyazaki is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 4 patents. His work focuses on developing innovative materials that have a wide range of applications.

Latest Patents

Miyazaki's latest patents include a photosensitive resin composition and a process for the formation of hydrogel. The first patent describes a photosensitive resin composition composed of a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin. This resin has an acid value of 150 mgKOH/g or more on a solid basis. The composition includes a photopolymerization initiator and water, allowing for effective solidification under hydrous conditions. The second patent involves a saponified poly(vinyl acetate)-based photosensitive resin that exhibits excellent storage stability and high sensitivity, making it suitable for various applications.

Career Highlights

Throughout his career, Mitsuharu Miyazaki has worked with prominent companies such as Toyo Gosei Co., Ltd. and Toyo Gosei Kogyo Co., Ltd. His experience in these organizations has contributed to his expertise in the development of advanced materials.

Collaborations

Miyazaki has collaborated with several professionals in his field, including Seigo Yamada and Masahiro Takano. These collaborations have further enhanced his research and development efforts.

Conclusion

Mitsuharu Miyazaki is a distinguished inventor whose work in photosensitive resin technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to pushing the boundaries of material science.