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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6140018 B1

PDFFull Text
Date of Patent:
Oct. 31, 2000

Filed:

Aug. 05, 1999

Photosensitive resin and composition thereof derived from saponified

Applicant:
Inventors:

Noriaki Tochizawa, Chiba, JP;

Mitsuharu Miyazaki, Ibaraki, JP;

Takaho Ito, Chiba, JP;

Assignee:

Toyo Gosei Kogyo Co., Ltd., Chiba, JP;

Attorney:

Huntley & Associates

Primary Examiner:

Janet Baxter

Assistant Examiner:

Sin J Lee

Int. Cl.
CPC ...
G03C / ; G03C / ; G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302871 ; 430909 ; 430325 ; 525 58 ; 525 59 ; 525 61 ;
Abstract

The invention provides a photosensitive resin and a photosensitive resin composition having excellent water resistance after hardening, excellent developability, and excellent patterning characteristics, and a pattern formation method making use of the composition. The invention provides saponified PVA photosensitive resin which contains structural units represented by formulas (I) and (II): ##STR1## the content of the structural units represented by formulas (I) and (II) in the resin being 0.5-10 mol % with respect to entirety of the structural units of the saponified product of PVA.

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Tochizawa, Noriaki. (2000). Photosensitive resin and composition thereof derived from saponified (U.S. Patent No. 6140018). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6140018

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