Hikone, Japan

Mitsuaki Yoshitani


Average Co-Inventor Count = 2.0

ph-index = 5

Forward Citations = 149(Granted Patents)


Location History:

  • Shiga-ken, JP (1998)
  • Shiga, JP (1999)
  • Hikone, JP (1999 - 2000)

Company Filing History:


Years Active: 1998-2000

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5 patents (USPTO):Explore Patents

Title: Mitsuaki Yoshitani: Innovator in Substrate Treatment Technologies

Introduction

Mitsuaki Yoshitani is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of substrate treatment technologies, holding a total of 5 patents. His innovative approaches have advanced the efficiency and effectiveness of substrate processing.

Latest Patents

Yoshitani's latest patents include a substrate treating apparatus and a method for treating substrates. This apparatus features a body with a carrying unit designed to transport substrates along an inclined carrying surface. The system supplies a treating liquid to the substrate during transport, ensuring effective treatment. Additionally, a receiving station is positioned upstream to adjust the substrate's posture from horizontal to inclined, while a delivering station downstream returns the substrate to its original horizontal posture.

Another significant patent is for an apparatus and method of cleaning substrates. This non-contact substrate rinsing apparatus boasts a high rinsing ability, utilizing both an ultrasonic rinsing nozzle and a high-pressure rinsing nozzle. The ultrasonic nozzle ejects rinsing liquid as a curtain, while the high-pressure nozzle directs a jet towards the substrate, effectively removing foreign matter and ensuring thorough cleaning.

Career Highlights

Throughout his career, Mitsuaki Yoshitani has worked with prominent companies such as Dainippon Screen Manufacturing Co., Ltd. and Fujitsu Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in substrate treatment.

Collaborations

Yoshitani has collaborated with notable colleagues, including Kazuo Kinose and Satoru Tanaka. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Mitsuaki Yoshitani's contributions to substrate treatment technologies exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving efficiency and effectiveness in substrate processing.

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