The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Jul. 10, 1996
Satoshi Suzuki, Shiga-ken, JP;
Mitsuaki Yoshitani, Shiga-ken, JP;
Yoshio Matsumura, Shiga-ken, JP;
Yasuhiro Akita, Shiga-ken, JP;
Hiroshi Yamamoto, Shiga-ken, JP;
Abstract
An apparatus for removing a treating liquid from main surfaces of a substrate that has undergone a wet surface treatment, includes a transport device for transporting the substrate, a first gas jetting device having a first jet opening for jetting a gas to a first main, upper surface of the substrate transported by the transport device, and a liquid removing chamber for preventing the treating liquid removed from the main surfaces of the substrate from scattering to ambient, the liquid removing chamber having a substrate inlet and a substrate outlet. A partition is mounted in the liquid removing chamber, with an upper end thereof contacting either an upper wall, a rear wall or a front wall of the liquid removing chamber. The partition extends between opposite side walls of the chamber parallel to direction of substrate transport. The partition divides an interior space of the chamber above the first main surface of the substrate into a first space upstream of the first jet opening with respect to the direction of substrate transport, and a second space downstream of the first jet opening with respect to the direction of substrate transport.