The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
Dec. 17, 1996
Mitsuaki Yoshitani, Shiga, JP;
Kazuo Kinose, Shiga, JP;
Satoru Tanaka, Shiga, JP;
Kenya Morinishi, Shiga, JP;
Masahiro Miyagi, Shiga, JP;
Naoshige Itami, Kanagawa, JP;
Kazuhiro Watanabe, Kanagawa, JP;
Dainippon Screen Mfg. Co., Ltd., , JP;
Fujitsu Limited, , JP;
Abstract
A substrate rinsing apparatus of a non-contact type having a high rinsing ability. An ultrasonic rinsing nozzle and a high-pressure rinsing nozzle are both disposed within the same rinsing apparatus. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle ejects a high-pressure rinsing jet toward the ultrasonic rinsing liquid which is ejected toward a substrate. Not only is foreign matter removed by ultrasonic rinsing, but foregoing matter is removed by the high-pressure rinsing jet and is carried away by a flow of the ultrasonic rinsing liquid and washed off the substrate toward a downstream side of rotation of the substrate.