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Years Active: 1999
Title: Satoru Tanaka - Innovator in Substrate Cleaning Technology
Introduction
Satoru Tanaka is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of substrate cleaning technology, particularly with his innovative approach to rinsing apparatuses. His work has led to advancements that enhance the efficiency and effectiveness of cleaning processes in various industries.
Latest Patents
Satoru Tanaka holds a patent for an "Apparatus for and method of cleaning substrate." This invention features a substrate rinsing apparatus of a non-contact type that boasts a high rinsing ability. The design incorporates both an ultrasonic rinsing nozzle and a high-pressure rinsing nozzle within the same apparatus. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle directs a high-pressure rinsing jet toward the ultrasonic rinsing liquid. This dual-action mechanism not only removes foreign matter through ultrasonic rinsing but also utilizes the high-pressure rinsing jet to carry away contaminants, ensuring a thorough cleaning process.
Career Highlights
Throughout his career, Satoru Tanaka has worked with prominent companies, including Dainippon Screen Manufacturing Co., Ltd. and Fujitsu Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant technological advancements in substrate cleaning.
Collaborations
Satoru has collaborated with esteemed colleagues such as Mitsuaki Yoshitani and Kazuo Kinose. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in the field.
Conclusion
Satoru Tanaka's contributions to substrate cleaning technology exemplify his dedication to innovation and excellence. His patented apparatus showcases the potential for improved cleaning processes across various applications. His work continues to influence the industry and inspire future advancements.